VAT valve technology for precise pressure control in semiconductor manufacturing

by J. Groh - 2025-11-19

In semiconductor production, the stability of pressure conditions determines the quality of entire process steps. The VAT valve shown here has been one of the most widely used solutions in this field for decades. The latest generation combines higher speed, more precise movement, and a modern controller architecture that ensures long-term system stability and spare parts availability.

IC2 controller pressure control in semiconductor manufacturing
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VAT valve with new generation of controller and activator

The valve presented is considered a high runner because it has been operating reliably in a wide variety of systems for many years. The current version is equipped with a new generation of controller and activator, which enables even faster and more sensitive pressure control. The machine is designed to run pressure curves exactly according to process specifications, without delays or irregularities. Especially in processes such as the Bosch process, where every nuance of pressure dynamics is crucial, high precision becomes a key quality factor. The further development affects not only speed but also movement precision. The valve responds to minimal changes in the setpoint and keeps the process chamber within a stable pressure window, even during rapid load changes.

VAT precision valve for semiconductor processes

IC2 controller ensures future-proofing and stable supply

One key point concerns long-term technical security. The previous IC1 controller has been unavailable for some time, making the supply of spare parts increasingly difficult. With the new IC2 controller, VAT ensures future-proofing: The platform is designed for the long term, supports modern control logic, and guarantees a continuous supply of compatible components. This is crucial for operators in the semiconductor industry because production lines are rarely replaced in short cycles.

Communication protocol pressure conditions process chamber and vacuum pump

Functional principle between process chamber and vacuum pump

The valve is typically located between the process chamber and the vacuum pump. Its task is to maintain defined pressure conditions and precisely specified pressure curves. To do this, the gate opens and closes depending on the process status and follows the respective specifications of the system. Depending on the system, different communication protocols are used, such as DeviceNet, serial connection, or Profibus. This variability facilitates integration into existing manufacturing architectures.

VAT valve technology SEMICON 2025

Material variety, sizes, and configured coatings

The product is available in several sizes and covers different diameters. Users can also choose from variable material options, sealing materials, and coatings to adapt the valve to chemically demanding, thermally stressed, or particularly sensitive processes. The flexible design allows it to be used in a wide variety of chamber designs.

Self-learning algorithm and refurbishment for long service life

An integrated self-learning algorithm monitors the control behavior and continuously optimizes the control system. This ensures that precision is maintained even after long periods of use. In addition, VAT places particular emphasis on serviceability in the new generation. This includes a fixed-price refurbishment program that makes valve overhaul more predictable and keeps operating costs stable in the line.

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